C CVD Flamme

Physical and Chemical Vapour Deposition

The metallisation of monofilaments and yarns is examined through Physical Vapour Deposition (PVD) with continuous processing, for which the TITV provides a low-pressure plasma system.

Besides plasma-chemical activation of surfaces in vacuum and wet-chemical seeding we utilize alternative procedures such as the flame-pyrolytic generation (C-CVD – Combustion Chemical Vapour Deposition) of oxide nanofilms like SiOx under atmospheric conditions.


PVD system